Analysis and modeling of DMOS FBSOA limited by n-p-n leakage diffusion current

Failure of DMOS self-heated in saturation below the avalanche threshold is usually related to an activation of the parasitic n-p-n transistor. In this work we show that the exponential increase of the leakage diffusion current of the n-p-n is sufficient to cause thermal runaway, even for a slightly...

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Bibliographic Details
Published inProceedings. ISPSD '05. The 17th International Symposium on Power Semiconductor Devices and ICs, 2005 pp. 331 - 334
Main Authors Denison, M., Pfost, M., Stecher, M., Silber, D.
Format Conference Proceeding
LanguageEnglish
Published IEEE 2005
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Summary:Failure of DMOS self-heated in saturation below the avalanche threshold is usually related to an activation of the parasitic n-p-n transistor. In this work we show that the exponential increase of the leakage diffusion current of the n-p-n is sufficient to cause thermal runaway, even for a slightly reverse body-source bias caused by the internal ballasting source resistance. Adding this current contribution to a basic DMOS compact model allows simulating the thermal limit of large DMOS transistors considered as distributed electrothermal networks. To our knowledge it is the first report of a quantitative DMOS FBSOA model accounting for the instabilities driven by the temperature dependences of both MOS and n-p-n components
ISBN:0780388909
9780780388901
ISSN:1063-6854
1946-0201
DOI:10.1109/ISPSD.2005.1488018