Design for Reliability for Wafer Level System in Package

• Published in: 2008 2nd Electronics System-Integration Technology Conference pp. 293 - 298
• Main Authors: Stoyanov, S., Strusevich, N., Rizvi, J., Georgel, V., Yannou, J.-M., Bailey, C.
• Format: Conference Proceeding
• Language: English
• Published: IEEE 01.09.2008
• Subjects: Costs; Design methodology; Design optimization; Fabrication; Finite element methods; Packaging; Semiconductor device modeling; Thermomechanical processes; Uncertainty; Wafer scale integration
• ISBN: 9781424428137; 1424428130
• DOI: 10.1109/ESTC.2008.4684364

This paper discusses the Design for Reliability modelling of several System-in-Package (SiP) structures developed by NXP and advanced on the basis of Wafer Level Packaging (WLP). Two different types of Wafer Level SiP (WLSiP) are presented and discussed. The main focus is on the modelling approach that has been adopted to investigate and analyse the board level reliability of the presented SiP configurations. Thermo-mechanical non-linear Finite Element Analysis (FEA) is used to analyse the effect of various package design parameters on the reliability of the structures and to identify design trends towards package optimisation. FEA is used also to gain knowledge on moulded wafer shrinkage and related issues during the wafer level fabrication. The paper provides a brief outline and demonstration of a design methodology for reliability driven design optimisation of SiP. The study emphasises the advantages of applying the methodology to address complex design problems where several requirements may exist and uncertainties and interactions between parameters in the design are common.