APA (7th ed.) Citation

Teodorescu, V. S., Ghica, C., Maraloiu, A. V., Kuncser, A., Lepadatu, A. M., Stavarache, I., . . . Dinescu, M. (2016, October). Fast atomic diffusion in amorphous films induced by laser pulse annealing. CAS 2016 proceedings : 2016 International Semiconductor Conference : 39th edition, October 10-12, Sinaia, Romania, 155-158. https://doi.org/10.1109/SMICND.2016.7783070

Chicago Style (17th ed.) Citation

Teodorescu, V. S., et al. "Fast Atomic Diffusion in Amorphous Films Induced by Laser Pulse Annealing." CAS 2016 Proceedings : 2016 International Semiconductor Conference : 39th Edition, October 10-12, Sinaia, Romania Oct. 2016: 155-158. https://doi.org/10.1109/SMICND.2016.7783070.

MLA (9th ed.) Citation

Teodorescu, V. S., et al. "Fast Atomic Diffusion in Amorphous Films Induced by Laser Pulse Annealing." CAS 2016 Proceedings : 2016 International Semiconductor Conference : 39th Edition, October 10-12, Sinaia, Romania, Oct. 2016, pp. 155-158, https://doi.org/10.1109/SMICND.2016.7783070.