High performance micro-machined inductors on CMOS substrate

• Published in: IEEE MTT-S International Microwave Symposium Digest, 2005 pp. 701 - 704
• Main Authors: Dae-Hee Weon, Jeong-Il Kim, Jong-Hyeok Jeon, Saeed Mohammadi, Katehi, L.P.B.
• Format: Conference Proceeding
• Language: English
• Published: IEEE 2005
• Subjects: Chromium; CMOS process; CMOS technology; Conductivity; Gold; Inductors; Micromachining; Q factor; Resonant frequency; Testing

Using a combination of micromachining and three-dimensional (3-D) processing technologies, we have designed, fabricated, and tested inductors on CMOS grade Si substrate (10/spl sim/20 /spl Omega/-cm resistivity) which exhibit very high quality factor and high resonant frequency. A 1.2 nH inductor in...