Passive and active probe arrays for dip-pen nanolithography

The development of passive and active atomic force microscope (AFM) probe arrays is reported in this paper. The devices are specifically designed to work with Dip-Pen Nanolithography and are fabricated using MEMS micromachining techniques. These devices can generate sub-100 nm patterns in a high spe...

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Bibliographic Details
Published inProceedings of the 2001 1st IEEE Conference on Nanotechnology. IEEE-NANO 2001 (Cat. No.01EX516) pp. 27 - 31
Main Authors Ming Zhang, Bullen, D., Ryu, K.S., Chang Liu
Format Conference Proceeding
LanguageEnglish
Published IEEE 2001
Subjects
Atomic force microscopy
Electron optics
High speed optical techniques
Lithography
Nanolithography
Optical sensors
Particle beam optics
Probes
Throughput
Ultraviolet sources
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Summary:The development of passive and active atomic force microscope (AFM) probe arrays is reported in this paper. The devices are specifically designed to work with Dip-Pen Nanolithography and are fabricated using MEMS micromachining techniques. These devices can generate sub-100 nm patterns in a high speed, parallel, and controllable fashion.
ISBN:0780372158
9780780372153
DOI:10.1109/NANO.2001.966387