Design considerations for a test structure which can be used to determine the optimum focus

A test structure which can be used to optimize the focus of wafer steppers is described. Simulation is used to determine the optimum setting for some of the design parameters in order to ensure maximum sensitivity of the device. Preliminary results indicate that the resistance of the structure is se...

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Bibliographic Details
Published inICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures pp. 275 - 280
Main Authors Walton, A.J., Fallon, M., Stevenson, J.T.M., Ross, A.W.S.
Format Conference Proceeding
LanguageEnglish
Published IEEE 1993
Subjects
Bars
Electric resistance
Electric variables measurement
Electrical resistance measurement
Focusing
Optical modulation
Position measurement
Size measurement
Testing
Time measurement
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Summary:A test structure which can be used to optimize the focus of wafer steppers is described. Simulation is used to determine the optimum setting for some of the design parameters in order to ensure maximum sensitivity of the device. Preliminary results indicate that the resistance of the structure is sensitive to changes in both exposure and focus, but that the 'noise' on the measurement masks the true sensitivity.< >
ISBN:0780308573
9780780308572
DOI:10.1109/ICMTS.1993.292907