Laser-induced fluorescence detection and kinetics of SiH2 radicals in Ar/H2/SiH4 RF discharges

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Bibliographic Details
Published inJournal of physics. D, Applied physics Vol. 33; no. 4; pp. 381 - 388
Main Authors Hertl, Michael, Jolly, Jacques
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 21.02.2000
Institute of Physics
Subjects
Electric discharges
Exact sciences and technology
Glow; corona
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma applications
Thin films
Fluorescence detector
PECVD
Experimental study
Radiofrequency
Spectroscopical observation
Laser assisted process
Discharge
Radicals
Glow discharges
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ISSN:0022-3727
1361-6463
DOI:10.1088/0022-3727/33/4/311