Sub-nm order fluctuation control of narrowed pitch 2K-GxL™ device for high contrast

We developed a novel 2 K vertical resolution device, the 2K-GxL device, for a super real projector, which enabled ribbon pitch to be miniaturized and the contrast ratio to be high simultaneously. Shrinking the ribbon pitch from 4.25 mum from that of previous 1K-GxL device to 3.00 mum was done by int...

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Bibliographic Details
Published in2009 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics pp. 45 - 46
Main Authors Ishikawa, K., Saruta, K., Oniki, K., Taguchi, A., Yamaguchi, M., Yamashita, K., Tamada, H.
Format Conference Proceeding
LanguageEnglish
Published IEEE 2009
Subjects
Costs
Diffraction
Displays
Fluctuations
Lithography
Mirrors
Optical devices
Reproducibility of results
Tensile stress
Transducers
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Summary:We developed a novel 2 K vertical resolution device, the 2K-GxL device, for a super real projector, which enabled ribbon pitch to be miniaturized and the contrast ratio to be high simultaneously. Shrinking the ribbon pitch from 4.25 mum from that of previous 1K-GxL device to 3.00 mum was done by introducing a tapered structure to the step region. A high device contrast ratio of 77000 was achieved by suppressing the fluctuation of ribbon height to under 0.32 nm by using the KrF lithography, and also developing a super flattened mirror.
ISSN:2160-5033
DOI:10.1109/OMEMS.2009.5338603