Temperature Dependence of Quasi-Ballistic Transport in n-Type and p-Type Nanosheets

The performance of nanosheets with a gate length of 14 nm is investigated by Monte Carlo (MC) and drift-diffusion (DD) simulation between 77 K and 400 K. Increasing at fixed workfunction the temperature from 300 K to 400 K leads for MC to an on-current (ION) increase as opposed to a reduction in DD....

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Bibliographic Details
Published in2024 IEEE Latin American Electron Devices Conference (LAEDC) pp. 1 - 4
Main Authors Bufler, F. M., Vermeersch, B., Mishra, S., Beckers, A., Ritzenthaler, R., Grill, A., Matagne, P., Hellings, G.
Format Conference Proceeding
LanguageEnglish
Published IEEE 08.05.2024
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Summary:The performance of nanosheets with a gate length of 14 nm is investigated by Monte Carlo (MC) and drift-diffusion (DD) simulation between 77 K and 400 K. Increasing at fixed workfunction the temperature from 300 K to 400 K leads for MC to an on-current (ION) increase as opposed to a reduction in DD. This is related to the quasi-ballistic regime which involves little phonon scattering reducing the temperature-induced penalty in contrast to a strong phonon-limited mobility degradation in DD. The same physics yields below 300 K to a stronger ION improvement for DD than for MC. In addition, the subthreshold swing is below 300 K for MC substantially worse than for DD. These results will have a strong impact on the thermal limitations of chip operation and the viability of cold CMOS.
ISSN:2835-3471
DOI:10.1109/LAEDC61552.2024.10555663