High pressure CVD inside microstructured optical fibres

We report the fabrication of semiconductor structures within holey fibres via a pressure driven microfluidic chemical vapour deposition process, demonstrating templated growth of crystalline Group IV semiconductor structures and devices in extreme aspect ratio geometries.

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Bibliographic Details
Published in2006 European Conference on Optical Communications pp. 1 - 2
Main Authors Sazio, Pier J. A., Amezcua-Correa, Adrian, Finlayson, Chris E., Hayes, John R., Scheidemantel, Thomas J., Zhang, Feng, Margine, Elena R., Baril, Neil F., Jackson, Bryan R., Badding, John V., Won, Dong-Jin, Gopalan, Venkatraman, Crespi, Vincent H.
Format Conference Proceeding
LanguageEnglish
Published IEEE 01.09.2006
Subjects
Chemical processes
Chemical vapor deposition
Crystal microstructure
Crystallization
Geometrical optics
Holey fibers
Microfluidics
Optical device fabrication
Optical fibers
Ultraviolet sources
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Summary:We report the fabrication of semiconductor structures within holey fibres via a pressure driven microfluidic chemical vapour deposition process, demonstrating templated growth of crystalline Group IV semiconductor structures and devices in extreme aspect ratio geometries.
ISSN:1550-381X
DOI:10.1109/ECOC.2006.4801105