Design and realisation of a pHEMT diode MMIC power limiter using 3D GaAs multilayer CPW technology
We report for the first time, the design and realization of a MMIC power limiter based on (0.5 × 200) μm 2 pHEMT Schottky diodes using an in-house 3D GaAs multilayer CPW technology. The system of three layers of conductor metals and two layers of sandwich polyimide as dielectric was employed. The li...
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Published in | 2015 European Microwave Conference (EuMC) pp. 522 - 525 |
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Main Authors | , , , , , |
Format | Conference Proceeding |
Language | English |
Published |
EuMA
01.09.2015
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Subjects | |
Online Access | Get full text |
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Summary: | We report for the first time, the design and realization of a MMIC power limiter based on (0.5 × 200) μm 2 pHEMT Schottky diodes using an in-house 3D GaAs multilayer CPW technology. The system of three layers of conductor metals and two layers of sandwich polyimide as dielectric was employed. The limiter design consists of a 50Ω V-shaped coplanar waveguide transmission line connected to a pair of shunt GaAs pHEMT diodes. Measured on-wafer S-parameter data demonstrates a maximum small signal insertion loss of less than 2 dB from 50 MHz to 3 GHz and a return loss better than 7.5 dB. |
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DOI: | 10.1109/EuMC.2015.7345815 |