Doping of Direct Gap Ge1-ySny Alloys to Attain Electroluminescence and Enhanced Photoluminescence
Low temperature (T < 300°C) in-situ doping protocols were developed for Ge1-ySny alloys with compositions above the indirect-to-direct gap crossover point, which were deposited using CVD. Trisilylphosphine (P(SiH3)3) was used as the n-type dopant source while diborane (B2H6) was used for n-type d...
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Published in | ECS transactions Vol. 69; no. 14; pp. 157 - 164 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
The Electrochemical Society, Inc
16.09.2015
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Abstract | Low temperature (T < 300°C) in-situ doping protocols were developed for Ge1-ySny alloys with compositions above the indirect-to-direct gap crossover point, which were deposited using CVD. Trisilylphosphine (P(SiH3)3) was used as the n-type dopant source while diborane (B2H6) was used for n-type doping. This enabled the fabrication of pin diode structures with compositions up to y = 0.137. These photodiodes exhibit electroluminescence at wavelengths up to 2700 nm. Furthermore, it was demonstrated that n-type doping enhances the photoluminescence obtained from these materials. |
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AbstractList | Low temperature (T < 300°C) in-situ doping protocols were developed for Ge1-ySny alloys with compositions above the indirect-to-direct gap crossover point, which were deposited using CVD. Trisilylphosphine (P(SiH3)3) was used as the n-type dopant source while diborane (B2H6) was used for n-type doping. This enabled the fabrication of pin diode structures with compositions up to y = 0.137. These photodiodes exhibit electroluminescence at wavelengths up to 2700 nm. Furthermore, it was demonstrated that n-type doping enhances the photoluminescence obtained from these materials. |
Author | Gallagher, James Dennis Xu, Chi Sims, Patrick Kouvetakis, John Menendez, Jose Senaratne, Charutha Lasitha |
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Title | Doping of Direct Gap Ge1-ySny Alloys to Attain Electroluminescence and Enhanced Photoluminescence |
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