Arrays of Microplasma-assisted Atomic Layer Deposition and Etching Free Patterning of Ga2O3 Thin Film with Flexible DUV Photodetector
Microplasma arrays assisted atomic layer deposition (MALD) have been used to deposit gallium oxide (Ga 2 O 3 ) thin film on the rigid and flexible substrate in order to fabricate deep-ultraviolet (DUV) photodetector under 254 nm illumination.
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Published in | 2021 Conference on Lasers and Electro-Optics (CLEO) pp. 1 - 2 |
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Main Authors | , , , , |
Format | Conference Proceeding |
Language | English |
Published |
OSA
01.05.2021
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Subjects | |
Online Access | Get full text |
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Summary: | Microplasma arrays assisted atomic layer deposition (MALD) have been used to deposit gallium oxide (Ga 2 O 3 ) thin film on the rigid and flexible substrate in order to fabricate deep-ultraviolet (DUV) photodetector under 254 nm illumination. |
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