Hierarchical modeling and control for re-entrant semiconductor fabrication lines: a mini-fab benchmark
This paper addresses the problem of controlling reentrant semiconductor fabrication lines. To focus the presentation, a virtual five-machine six-step mini-fab is used. This mini-fab developed by Intel in collaboration with ASU is intended to contain all of the features which make a real line difficu...
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Published in | 1997 IEEE 6th International Conference on Emerging Technologies and Factory Automation Proceedings, EFTA '97 pp. 508 - 513 |
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Main Authors | , , |
Format | Conference Proceeding |
Language | English |
Published |
IEEE
1997
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Subjects | |
Online Access | Get full text |
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Summary: | This paper addresses the problem of controlling reentrant semiconductor fabrication lines. To focus the presentation, a virtual five-machine six-step mini-fab is used. This mini-fab developed by Intel in collaboration with ASU is intended to contain all of the features which make a real line difficult to control. Industry-like policies are discussed and compared with control-theoretic hierarchical policies. |
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ISBN: | 0780341929 9780780341920 |
DOI: | 10.1109/ETFA.1997.616323 |