The coupling of an N-well CMOS fabrication laboratory course with the SEMATECH Center of Excellence in Multilevel Metallization at Rensselaer

The Center for Integrated Electronics (CIE) at Rensselaer Polytechnic Institute is utilizing front-end processing, developed for, and performed in, a CMOS fabrication laboratory course as a foundry service for back-end of the line search. The goal of the fabrication laboratory course is to expose st...

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Bibliographic Details
Published in[1993] Proceedings of the Tenth Biennial University/Government/Industry Microelectronics Symposium pp. 183 - 187
Main Authors Price, D.T., Gutmann, R.J., Haley, N.J., Muraka, S.P., Saxena, A.N., Chow, T.P., RamKumar, K., Lakshminarayanan, S., Bhalla, A.
Format Conference Proceeding
LanguageEnglish
Published IEEE 1993
Subjects
Circuit testing
CMOS process
CMOS technology
Cobalt
Copper
Fabrication
Laboratories
Lithography
Metallization
Silicides
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Summary:The Center for Integrated Electronics (CIE) at Rensselaer Polytechnic Institute is utilizing front-end processing, developed for, and performed in, a CMOS fabrication laboratory course as a foundry service for back-end of the line search. The goal of the fabrication laboratory course is to expose students to the fabrication of 2-micron CMOS integrated circuits through first level metallization and electrical testing. The SEMATECH Center of Excellence (SCOE) on Multilevel Metallization at Rensselaer is primarily focused on back-end of the line unit process research and has added an important task on process integration. The mask design and process steps used for both the course and SCOE research are outlined.< >
ISBN:0780309901
9780780309906
ISSN:0749-6877
2375-5350
DOI:10.1109/UGIM.1993.297010