MERIE Metal Etcher Induced Device Degradation And Subsequent Magnetic Field Enhancement Characterization

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Bibliographic Details
Published in2nd International Symposium on Plasma Process-Induced Damage pp. 153 - 156
Main Authors Yu, S.T., Ku, S.M., Chiang, A.M., Shu, H.J., Chen, P.H., Solo de Zaldivar, J.
Format Conference Proceeding
LanguageEnglish
Published IEEE 1997
Subjects
Ambient intelligence
Degradation
Diodes
Etching
Magnetic fields
MOSFET circuits
Plasma measurements
Production
Protection
Testing
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ISBN:9780965157711
0965157717
DOI:10.1109/PPID.1997.596726