Semi-automated method for the determination of the all-optical monitoring strategy of complex thin-film filters
One of the critical steps in the fabrication of complex optical interference filters is the precise control of the thickness of the layers during the fabrication process. However, the definition of the optimal optical monitoring strategy remains a challenge as it relies on user experience and there...
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Published in | Optics express |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Optical Society of America - OSA Publishing
29.04.2019
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Subjects | |
Online Access | Get full text |
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Summary: | One of the critical steps in the fabrication of complex optical interference filters is the precise control of the thickness of the layers during the fabrication process. However, the definition of the optimal optical monitoring strategy remains a challenge as it relies on user experience and there is no reliable automatic determination of this strategy. Here, we propose a semi-automated method that allows the determination of the optimal strategy. It is based on the combination of trinary mappings to select spectral regions that are compatible with optical monitoring and the use of the reflected phase error at a single wavelength versus optical monitoring wavelength. We show how this procedure can be used for the determination of either a single optical monitoring wavelength or a multi-wavelength procedure of a complex filter and confirm these theoretical results with an experimental demonstration. |
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ISSN: | 1094-4087 1094-4087 |
DOI: | 10.1364/OE.27.012383 |