Influence of Ion Bombardment and Annealing on the Structural and Optical Properties of TiOx Thin Films Deposited in Inductively Coupled TTIP/O-2 Plasma

TiO2 films were deposited in a low-pressure inductively coupled rf plasma in O-2/titanium tetraisopropoxide (TTIP). First, depositions were realized at floating potential using nitrogen as bubbling gas. The structural and optical properties of the films were studied, before and after annealing at 45...

Full description

Saved in:
Bibliographic Details
Published inPlasma processes and polymers Vol. 6; no. 51
Main Authors Granier, Agnès A., Begou, T., Makaoui, K., Soussou, A., Beche, B., Gaviot, Etienne, Besland, Marie-Paule, Goullet, Antoine
Format Journal Article
LanguageEnglish
Published Wiley-VCH Verlag 2009
Subjects
Condensed Matter
Engineering Sciences
Materials Science
Optics
Photonic
Physics
TTIP
titanium dioxide film
X-ray
annealing
PE-CVD
anatase
rutile
Online AccessGet full text

Cover

More Information
Summary:TiO2 films were deposited in a low-pressure inductively coupled rf plasma in O-2/titanium tetraisopropoxide (TTIP). First, depositions were realized at floating potential using nitrogen as bubbling gas. The structural and optical properties of the films were studied, before and after annealing at 450 degrees C under air. As expected, as-deposited films are amorphous, with a columnar structure. A post-annealing under flowing air allows obtaining partially crystallized films in anatase phase. Secondly, films were deposited using nitrogen and oxygen as bubbling gas. In both cases, TiO2-like films exhibit very similar structure and optical properties. Finally, the effect of biasing the substrate was investigated. An improvement of film proper-ties has been found for a bias voltage of -15 V at T < 100 degrees C: deposited TiO2 film is dense (3.7) with a high refractive index (n = 2.32 at 634 nm) and partially crystallized in rutile phase.
ISSN:1612-8850
1612-8869
DOI:10.1002/ppap.200931804