High-volume manufacturing requirements drive EUV source development

Extreme-ultraviolet (EUV) light source development has regularly been characterized as one of the critical issues facing the viability of EUV lithography. Output power and operational lifetimes remain top concerns for EUV sources. Industry efforts to date have focused primarily on the technical feas...

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Bibliographic Details
Published inSolid state technology Vol. 48; no. 5; p. 67
Main Authors Myers, David W, Fomenkov, Igor V, Partlo, William, Brandt, David C, Klene, Brian C
Format Magazine Article
LanguageEnglish
Published Tulsa PennWell Publishing Corp 01.05.2005
PennWell Corporation
Subjects
Analysis
Electronics industry
Lasers
Lithium
Lithography
Offset printing
Plasma
Ultraviolet radiation
United States
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Summary:Extreme-ultraviolet (EUV) light source development has regularly been characterized as one of the critical issues facing the viability of EUV lithography. Output power and operational lifetimes remain top concerns for EUV sources. Industry efforts to date have focused primarily on the technical feasibility of one approach or another, but less emphasis has been placed on the critical issue of commercial feasibility to reach high-volume manufacturing (HVM). This article summarizes the technical viability of discharge-produced plasma (DPP) and laser-produced plasma (LPP) light source concepts when compared to HVM requirements, and also describes Cymer's new LPP source development roadmap, which supports introduction of EUV lithography for the 32nm process node. [PUBLICATION ABSTRACT]
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ISSN:0038-111X