Axial distribution of a VHF H2 plasma produced by a narrow gap discharge

A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300 mm2. Axial distributions of the plasma parameters were examined using a movable Langmuir probe. The electron density had a hill-like profile near the center while the electron temperature arou...

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Published inJapanese Journal of Applied Physics Vol. 55; no. 1S
Main Authors Chen, Kuan-Chen, Chen, Chia-Fu, Lien, Cheng-Yang, Chiu, Kuo-Feng, Shi, Jen-Bin, Tsai, Yu-Jer, Lien, Ting-Kuei, Ogiwara, Kohei, Uchino, Kiichiro, Kawai, Yoshinobu
Format Journal Article
LanguageEnglish
Published The Japan Society of Applied Physics 01.01.2016
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Abstract A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300 mm2. Axial distributions of the plasma parameters were examined using a movable Langmuir probe. The electron density had a hill-like profile near the center while the electron temperature around the discharge electrode was higher than that near the center. It was found that the axial distribution of the plasma potential was considerably different from that based on ohmic heating. The measured sheath potentials around the discharge electrode were lower than the theoretical potentials. A simulation using a hybrid model was performed and compared the results with the experimental results.
AbstractList A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300 mm2. Axial distributions of the plasma parameters were examined using a movable Langmuir probe. The electron density had a hill-like profile near the center while the electron temperature around the discharge electrode was higher than that near the center. It was found that the axial distribution of the plasma potential was considerably different from that based on ohmic heating. The measured sheath potentials around the discharge electrode were lower than the theoretical potentials. A simulation using a hybrid model was performed and compared the results with the experimental results.
Author Kawai, Yoshinobu
Lien, Cheng-Yang
Shi, Jen-Bin
Chen, Chia-Fu
Chen, Kuan-Chen
Chiu, Kuo-Feng
Uchino, Kiichiro
Ogiwara, Kohei
Tsai, Yu-Jer
Lien, Ting-Kuei
Author_xml – sequence: 1
  givenname: Kuan-Chen
  surname: Chen
  fullname: Chen, Kuan-Chen
  organization: Feng Chia University Department of Materials Science and Engineering, Taichung 40724, Taiwan
– sequence: 2
  givenname: Chia-Fu
  surname: Chen
  fullname: Chen, Chia-Fu
  email: cfchen1944@gmail.com
  organization: Feng Chia University Department of Electronic Engineering, Taichung 40724, Taiwan
– sequence: 3
  givenname: Cheng-Yang
  surname: Lien
  fullname: Lien, Cheng-Yang
  organization: Feng Chia University Department of Materials Science and Engineering, Taichung 40724, Taiwan
– sequence: 4
  givenname: Kuo-Feng
  surname: Chiu
  fullname: Chiu, Kuo-Feng
  organization: Feng Chia University Department of Materials Science and Engineering, Taichung 40724, Taiwan
– sequence: 5
  givenname: Jen-Bin
  surname: Shi
  fullname: Shi, Jen-Bin
  organization: Feng Chia University Department of Electronic Engineering, Taichung 40724, Taiwan
– sequence: 6
  givenname: Yu-Jer
  surname: Tsai
  fullname: Tsai, Yu-Jer
  organization: ULVAC Taiwan Inc. , Hsinchu 30078, Taiwan
– sequence: 7
  givenname: Ting-Kuei
  surname: Lien
  fullname: Lien, Ting-Kuei
  organization: Helius Power Corp., Ltd. , Taichung 42881, Taiwan
– sequence: 8
  givenname: Kohei
  surname: Ogiwara
  fullname: Ogiwara, Kohei
  organization: Kyushu University Interdisciplinary Graduate School of Engineering Sciences, Kasuga, Fukuoka 816-8580, Japan
– sequence: 9
  givenname: Kiichiro
  surname: Uchino
  fullname: Uchino, Kiichiro
  organization: Kyushu University Interdisciplinary Graduate School of Engineering Sciences, Kasuga, Fukuoka 816-8580, Japan
– sequence: 10
  givenname: Yoshinobu
  surname: Kawai
  fullname: Kawai, Yoshinobu
  email: kawai@aees.kyushu-u.ac.jp
  organization: Kyushu University Interdisciplinary Graduate School of Engineering Sciences, Kasuga, Fukuoka 816-8580, Japan
BookMark eNptkM1LxDAQxYOsYHf16jlXhdZJmqTNsSyudVlQcPEapm1aW9am9AP1v7dlPXoahnm_95i3JqvWtZaQWwZBJFX0sN8nr4GUAbAkBXZBPBaKyBeg5Ip4AJz5QnN-RdbD0MyrkoJ5JE2-azzRoh7Gvs6msXYtdSVF-p7uaMppd8LhE2nXu2LKbUGzn_nWYt-7L1pht4D5B_aVvSaXJZ4Ge_M3N-S4ezxuU__w8vS8TQ5-xYUafc0LCVzzEIQNVQYZQhwyjESWIQKiilWkS5vbuODMAgfAGK3USkuJSocbcne2rV1nGjf17RxmmgY7I6Vhb-b8vemKctbe_6NlYJa6zFLXwpyB8BdI2F0e
CODEN JJAPB6
ContentType Journal Article
Copyright 2016 The Japan Society of Applied Physics
Copyright_xml – notice: 2016 The Japan Society of Applied Physics
DOI 10.7567/JJAP.55.01AH01
DatabaseTitleList
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Physics
EISSN 1347-4065
ExternalDocumentID PL15045
GroupedDBID AALHV
ACGFS
ACNCT
ALMA_UNASSIGNED_HOLDINGS
ATQHT
CEBXE
F5P
IOP
IZVLO
KOT
MC8
N5L
QTG
RNS
SJN
ID FETCH-LOGICAL-g246t-92d50292304e36b0ba0831a74bbaa0aa68679fece8d21e0200a8ae596955a693
IEDL.DBID IOP
ISSN 0021-4922
IngestDate Thu Jan 07 13:53:11 EST 2021
Wed Aug 21 03:33:27 EDT 2024
IsPeerReviewed true
IsScholarly true
Issue 1S
Language English
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-g246t-92d50292304e36b0ba0831a74bbaa0aa68679fece8d21e0200a8ae596955a693
PageCount 5
ParticipantIDs iop_journals_10_7567_JJAP_55_01AH01
PublicationCentury 2000
PublicationDate 2016-01-01
PublicationDateYYYYMMDD 2016-01-01
PublicationDate_xml – month: 01
  year: 2016
  text: 2016-01-01
  day: 01
PublicationDecade 2010
PublicationTitle Japanese Journal of Applied Physics
PublicationTitleAlternate Jpn. J. Appl. Phys
PublicationYear 2016
Publisher The Japan Society of Applied Physics
Publisher_xml – name: The Japan Society of Applied Physics
SSID ssj0026541
ssj0026590
ssj0026540
ssj0064762
Score 2.1335413
Snippet A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300 mm2. Axial distributions of the plasma parameters...
SourceID iop
SourceType Enrichment Source
Publisher
Title Axial distribution of a VHF H2 plasma produced by a narrow gap discharge
URI https://iopscience.iop.org/article/10.7567/JJAP.55.01AH01
Volume 55
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnV3dS8MwEA8yEfTBj6k4vwjqa2ubJWnzOMRR96ADpwxfymVNhxO34jpQ_3ovbZ1TfBDfGu7aXn9ccpdw_R0hZzoFFWjlOQlGF4djCuuEgqe45_GEltzTIi2qLa5ldMc7fdFfaPX1OMmqpd_Fy5IouITQzu9AyOC802l1XWHZNluR_XNruRmGylZzXd1053stKSyHydfAXxiouUTyQFZ84mioYqykdfzlNRh60J6F0NPeIA-fRpcVJ0_uLNfu4P0Hn-O_vmqTrFcJKW2ViltkyYzrZG2BprBOVooy0cF0m0StV_RXmli23apRFp2kFOh91KYRoxnm4s9As4JG1iRUv6FsXPA80iFk9saCmsnskF77sncROVUvBmfIuMwdxRLhMWWPkE1Tak-DbVEGAdcawAOQlrgvNQMTJsw3mIN6EIIRSiohQKrmLqmNJ2OzRygYzhM_QbBNyDUDMCnjzZBDIANceMMGOUWM4moqTWPcpViAYgtQLERcAtQgJ9-0RiPIrNS_rRTiLEn3__SoA7KKflqdqxySWv4yM0eYaeT6uPCpD88SxW8
link.rule.ids 315,786,790,27955,27956,38898,53875
linkProvider IOP Publishing
linkToPdf http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnZ1bS8MwFMeDFxR98C7Oa1Bfu7VZkjaPQx11ig684Fs5WdPBxK24Cuqn96QNOsUH8a0haZv-yeWccPo7hBzrDFSole-luLt4HE1YLxI8Q5_HF1pyX4usjLa4kvEd7zyIBxebU_4LM8rd0l_HywoUXElo53coZNjodFrdurC0zVbsB408zabJLM7b0Eb0nV93P_0tKSzH5KsQTBTUZ43koXRMceysYqxCO_7yKtx-sE8T2097ucqxOi6phTbq5LH-Uuh67_0H0_HfX7ZClpxhSltV41UyZYZrZHECV7hG5spw0d54ncStVxy3NLXUXZcwi44yCvQ-btOY0Rxt8iegeYmTNSnVb1g3LHmPtA-5vbFENJkNcts-uz2JPZeTweszLgtPsVT4TNmjZNOU2tdgU5VByLUG8AGkBfhlpmeilAUGbVEfIjBCSSUESNXcJDPD0dBsEQqG8zRIUXATcc0ATMZ4M-IQyhAX4KhGjlCnxE2pcYLeihUpsSIlQiSVSDVy-K3VYAC5rQ1uXIMEVdz-06MOyHz3tJ1cnl9d7JAFHLruqGWXzBTPL2YPjY9C75dD7APbBsrP
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Axial+distribution+of+a+VHF+H2+plasma+produced+by+a+narrow+gap+discharge&rft.jtitle=Japanese+Journal+of+Applied+Physics&rft.au=Chen%2C+Kuan-Chen&rft.au=Chen%2C+Chia-Fu&rft.au=Lien%2C+Cheng-Yang&rft.au=Chiu%2C+Kuo-Feng&rft.date=2016-01-01&rft.pub=The+Japan+Society+of+Applied+Physics&rft.issn=0021-4922&rft.eissn=1347-4065&rft.volume=55&rft.issue=1S&rft_id=info:doi/10.7567%2FJJAP.55.01AH01&rft.externalDocID=PL15045
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0021-4922&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0021-4922&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0021-4922&client=summon