Axial distribution of a VHF H2 plasma produced by a narrow gap discharge

A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300 mm2. Axial distributions of the plasma parameters were examined using a movable Langmuir probe. The electron density had a hill-like profile near the center while the electron temperature arou...

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 55; no. 1S
Main Authors Chen, Kuan-Chen, Chen, Chia-Fu, Lien, Cheng-Yang, Chiu, Kuo-Feng, Shi, Jen-Bin, Tsai, Yu-Jer, Lien, Ting-Kuei, Ogiwara, Kohei, Uchino, Kiichiro, Kawai, Yoshinobu
Format Journal Article
LanguageEnglish
Published The Japan Society of Applied Physics 01.01.2016
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Summary:A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300 mm2. Axial distributions of the plasma parameters were examined using a movable Langmuir probe. The electron density had a hill-like profile near the center while the electron temperature around the discharge electrode was higher than that near the center. It was found that the axial distribution of the plasma potential was considerably different from that based on ohmic heating. The measured sheath potentials around the discharge electrode were lower than the theoretical potentials. A simulation using a hybrid model was performed and compared the results with the experimental results.
ISSN:0021-4922
1347-4065
DOI:10.7567/JJAP.55.01AH01