Axial distribution of a VHF H2 plasma produced by a narrow gap discharge
A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300 mm2. Axial distributions of the plasma parameters were examined using a movable Langmuir probe. The electron density had a hill-like profile near the center while the electron temperature arou...
Saved in:
Published in | Japanese Journal of Applied Physics Vol. 55; no. 1S |
---|---|
Main Authors | , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
The Japan Society of Applied Physics
01.01.2016
|
Online Access | Get full text |
Cover
Loading…
Summary: | A capacitively coupled VHF H2 plasma was produced with a conventional parallel plate electrode of 400 × 300 mm2. Axial distributions of the plasma parameters were examined using a movable Langmuir probe. The electron density had a hill-like profile near the center while the electron temperature around the discharge electrode was higher than that near the center. It was found that the axial distribution of the plasma potential was considerably different from that based on ohmic heating. The measured sheath potentials around the discharge electrode were lower than the theoretical potentials. A simulation using a hybrid model was performed and compared the results with the experimental results. |
---|---|
ISSN: | 0021-4922 1347-4065 |
DOI: | 10.7567/JJAP.55.01AH01 |