Ultrashallow junction formation by ion implant and RTA

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Bibliographic Details
Published inSolid state technology Vol. 40; no. 12; p. 71
Main Authors Downey, Daniel F, Osburn, Carlton M, Marcus, Steven D
Format Magazine Article
LanguageEnglish
Published PennWell Publishing Corp 01.12.1997
Subjects
Annealing
Ion implantation
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ISSN:0038-111X