Evaluating and treating CMP wastewater

Before the recent introduction of copper CMP, the CMP waste stream was not a major issue. Silica and fluoride contaminants were typically diluted with other fab process water or treated by the fab acid waste neutralization system (AWNS). However, because the AWNS is not equipped to handle high level...

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Bibliographic Details
Published inSemiconductor International Vol. 23; no. 12; p. 85
Main Authors Golden, Josh H, Small, Robert, Pagan, Louis, Shang, Cass, Ragavan, Srini
Format Trade Publication Article
LanguageEnglish
Published Newton Reed Business Information, a division of Reed Elsevier, Inc 01.10.2000
Subjects
Aluminum
Ammonia
Charged particles
Chemistry
Copper
Effluents
Fluorides
Gravity
Heavy metals
Manufacturing
Metals
Molecular weight
Oxidation
Pollution control
Regulation
Semiconductors
Statistical data
Surfactants
Waste materials
Water treatment
United States > US
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Summary:Before the recent introduction of copper CMP, the CMP waste stream was not a major issue. Silica and fluoride contaminants were typically diluted with other fab process water or treated by the fab acid waste neutralization system (AWNS). However, because the AWNS is not equipped to handle high levels of suspended solids or especially, heavy metals, fabs are beginning to run the risk of violating local regulations for these contaminants in discharged wastewater. To effectively meet regulatory challenges and safely treat CMP wastewater, it is useful to become familiar with the CMP wastewater chemistry, treatment options and regulatory issues regarding copper in CMP effluent.
ISSN:0163-3767