Line edge roughness: experimental results related to a two-parameter model

Different techniques are available to describe line edge roughness (LER). Besides the standard deviation ( σ), the spatial frequency components can be resolved using the power spectral density. Experiments show that LER can be described using a two-parameter model based on a first-order autoregressi...

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Bibliographic Details
Published inMicroelectronic engineering Vol. 73; pp. 265 - 270
Main Authors Leunissen, L.H.A., Lawrence, W.G., Ercken, M.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 01.06.2004
Subjects
Correlation length
Line edge roughness
Metrology
Metrology
Line edge roughness
Correlation length
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Summary:Different techniques are available to describe line edge roughness (LER). Besides the standard deviation ( σ), the spatial frequency components can be resolved using the power spectral density. Experiments show that LER can be described using a two-parameter model based on a first-order autoregressive process. In the model a correlation length and σ are determined to explain LER effects in the range up to several μm. Experiments are presented in which the model is verified and a physical background for the two constraints is given. A chemical model of the formation of the LER is presented. The impact of this model on the LER and critical dimension variation description as defined by the ITRS roadmap is determined.
Bibliography:SourceType-Scholarly Journals-2
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ObjectType-Conference Paper-1
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ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2004.02.051