Carbanion mechanisms: XVIII. Generation of silyl anions by nucleophilic cleavage of disilanes

Organosilyl potassium compounds are conveniently generated by cleavage of hexaorganodisilanes with potassium t-butoxide in common solvents other than HMPA ( i.e. in THF or DME). Nucleophilic attack on unsymmetrical disilanes results in formation of the more stable silyl anion, i.e. the one with the...

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Bibliographic Details
Published inJournal of organometallic chemistry Vol. 437; no. 1; pp. 85 - 89
Main Authors Buncel, Erwin, Venkatachalam U. Edlund, T.Krishnan
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier B.V 29.08.1992
Elsevier Science
Subjects
Chemistry
Exact sciences and technology
Organic chemistry
Organometalloidal and organometallic compounds
Preparations and properties
Si derivatives
Alkoxide
Nucleophilic reaction
Silicon Organic compounds
Scission
Organic salt
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Summary:Organosilyl potassium compounds are conveniently generated by cleavage of hexaorganodisilanes with potassium t-butoxide in common solvents other than HMPA ( i.e. in THF or DME). Nucleophilic attack on unsymmetrical disilanes results in formation of the more stable silyl anion, i.e. the one with the most phenyl groups bonded to silicon.
ISSN:0022-328X
1872-8561
DOI:10.1016/0022-328X(92)83433-I