VUV photoionization of Si(CH 3) 2Cl 2 using synchrotron radiation
The complicated dissociative photoionization of Si(CH 3) 2Cl 2 has been investigated with photoionization mass spectrometry (PIMS) and a synchrotron as source of vacuum ultraviolet (VUV) radiation. We determined appearance energies (AE) of the parent cation Si ( CH 3 ) 2 Cl 2 + and various ionic fra...
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| Published in | Chemical physics letters Vol. 394; no. 1; pp. 126 - 131 |
|---|---|
| Main Authors | , , , |
| Format | Journal Article |
| Language | English |
| Published |
Elsevier B.V
11.08.2004
|
| Online Access | Get full text |
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| Summary: | The complicated dissociative photoionization of Si(CH
3)
2Cl
2 has been investigated with photoionization mass spectrometry (PIMS) and a synchrotron as source of vacuum ultraviolet (VUV) radiation. We determined appearance energies (AE) of the parent cation
Si
(
CH
3
)
2
Cl
2
+
and various ionic fragments
-
Si
(
CH
3
)
2
Cl
+
,
Si
(
CH
3
)
Cl
2
+
,
Si
(
CH
3
)
Cl
+
, etc. – originating from photofragmentation. The appearance energy of
Si
(
CH
3
)
2
Cl
2
+
is 10.41 eV, in agreement with measurements of the photoelectron spectrum. Relative photoexcitation spectra of individual fragment ion yields are obtained and the dissociative processes are discussed. A comparison of Si(CH
3)
2Cl
2 and Si(CH
3)Cl
3 provides insight and understanding of fragmentation processes on dissociative photoionization of gaseous chlorosilanes. |
|---|---|
| ISSN: | 0009-2614 1873-4448 |
| DOI: | 10.1016/j.cplett.2004.06.077 |