Effect of annealing on the microstructure of NiFe 1.925Dy 0.075O 4 thin films

• Published in: Thin solid films Vol. 520; no. 6; pp. 1794 - 1798
• Main Authors: Bharathi, K. Kamala, Vemuri, R.S., Noor-A-Alam, M., Ramana, C.V.
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 2012
• Subjects: Annealing; Dy-doping; Lattice expansion; Magnetization; Microstructure; Ni ferrite; Strain; Annealing; Magnetization; Dy-doping; Microstructure; Lattice expansion; Ni ferrite; Strain
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2011.08.086

Dysprosium-doped nickel-ferrite (NiFe 1.925Dy 0.075O 4) thin films were fabricated using RF sputter-deposition. Structural studies indicate that the effect of post-deposition annealing is significant on structural evolution in NiFe 1.925Dy 0.075O 4 films. As-grown NiFe 1.925Dy 0.075O 4 films were amorphous. Annealing (T a) in air at 450–1000 °C results in the formation of nanocrystalline NiFe 1.925Dy 0.075O 4 films, which crystallize in the inverse spinel structure. The average grain size ( L) increases from 5 to 40 nm with increasing T a from 450 to 1000 °C. Lattice constant of NiFe 1.925Dy 0.075O 4 films is higher compared to that of NiFe 2O 4 due to partial substitution of Dy 3+ ions for Fe 3+ ions. The lattice parameter increases from 8.353 to 8.362 Å with increasing T a from 450 to 1000 °C which is attributed to the lattice-strain developed in the NiFe 1.925Dy 0.075O 4 films with increasing T a. The corresponding density of NiFe 1.925Dy 0.075O 4 films increases from 3.2 to 3.9 g/cm 3 with increasing annealing temperature. Magnetization measurements indicate the ferromagnetic behavior of all the films while the coercive field values at 300 K are found to be 0.0134 T and 0.0162 T for as grown and T a = 1000 °C films, respectively.