Low temperature deposition of SiO insulator film with newly developed facing electrodes chemical vapor deposition

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Bibliographic Details
Published inVacuum Vol. 101; pp. 189 - 192
Main Authors Matsuda, Tokiyoshi, Furuta, Mamoru, Hiramatsu, Takahiro, Furuta, Hiroshi, Kawaharamura, Toshiyuki, Hirao, Takashi
Format Journal Article
LanguageEnglish
Published 01.03.2014
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ISSN:0042-207X
DOI:10.1016/j.vacuum.2013.08.003