Electronic Properties of Thin HfO 2 Films Fabricated by Atomic Layer Deposition on 4H-SiC

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Bibliographic Details
Published inActa physica Polonica, A Vol. 119; no. 5; pp. 696 - 698
Main Authors Taube, A., Gierałtowska, S., Gutt, T., Małachowski, T., Pasternak, I., Wojciechowski, T., Rzodkiewicz, W., Sawicki, M., Piotrowska, A.
Format Journal Article
LanguageEnglish
Published 01.05.2011
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ISSN:0587-4246
1898-794X
DOI:10.12693/APhysPolA.119.696