Fast Growth of Polycrystalline Film in SiCl 4 /H 2 Plasma
Saved in:
Published in | Chinese physics letters Vol. 21; no. 6; pp. 1168 - 1170 |
---|---|
Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
01.06.2004
|
Online Access | Get full text |
Cover
Loading…
ISSN: | 0256-307X 1741-3540 |
---|---|
DOI: | 10.1088/0256-307X/21/6/053 |