Integration of Atomically Dispersed Cu–N 4 Sites with C 3 N 4 for Enhanced Photo-Fenton Degradation over a Nonradical Mechanism

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Bibliographic Details
Published inACS ES&T engineering Vol. 3; no. 2; pp. 150 - 164
Main Authors Dong, Shuqian, Chen, Xu, Su, Linfeng, Wen, Yingjie, Wang, Yuechu, Yang, Qihao, Yi, Li, Xu, Wenwen, Yang, Qiu, He, Peilei, Zhu, Yunqing, Lu, Zhiyi
Format Journal Article
LanguageEnglish
Published 10.02.2023
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ISSN:2690-0645
2690-0645
DOI:10.1021/acsestengg.2c00261