In situ study on the thermal stability and interfaces properties of Er 2 O 3 /Al 2 O 3 /Si multi stacked films by X-ray photoelectron spectroscopy

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Bibliographic Details
Published inSuperlattices and microstructures Vol. 104; pp. 415 - 421
Main Authors Gao, Baolong, Mamat, Mamatrishat, Ghupur, Yasenjan, Ablat, Abduleziz, Ibrahim, Kurash, Wang, Jiaou, Liu, Chen, Zhao, Jiali
Format Journal Article
LanguageEnglish
Published 01.04.2017
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ISSN:0749-6036
DOI:10.1016/j.spmi.2017.02.050