In situ study on the thermal stability and interfaces properties of Er 2 O 3 /Al 2 O 3 /Si multi stacked films by X-ray photoelectron spectroscopy
Saved in:
Published in | Superlattices and microstructures Vol. 104; pp. 415 - 421 |
---|---|
Main Authors | , , , , , , , |
Format | Journal Article |
Language | English |
Published |
01.04.2017
|
Online Access | Get full text |
Cover
Loading…
ISSN: | 0749-6036 |
---|---|
DOI: | 10.1016/j.spmi.2017.02.050 |