Role of annealing temperature in the oxide charge distribution in high- $$\kappa $$ κ -based MOS devices: simulation and experiment

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Published inJournal of computational electronics Vol. 15; no. 3; pp. 795 - 800
Main Authors Biswas, Debaleen, Chakraborty, Ayan, Chakraborty, Supratic
Format Journal Article
LanguageEnglish
Published 01.09.2016
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Author Biswas, Debaleen
Chakraborty, Ayan
Chakraborty, Supratic
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MJ McNutt (829_CR2) 1974; 45
H Bo (829_CR5) 2013; 22
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Title Role of annealing temperature in the oxide charge distribution in high- $$\kappa $$ κ -based MOS devices: simulation and experiment
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