Application of ion beam techniques for preparation of metal ion-implanted TiO 2 thin film photocatalyst available under visible light irradiation: metal ion-implantation and ionized cluster beam method

• Published in: Journal of synchrotron radiation Vol. 8; no. 2; pp. 569 - 571
• Main Authors: Yamashita, Hiromi, Harada, Masaru, Misaka, Junko, Takeuchi, Massto, Ichihashi, Yuichi, Goto, Fumisato, Ishida, Masaya, Sasaki, Toshio, Anpo, Masakazu
• Format: Journal Article
• Language: English
• Published: 01.03.2001
• ISSN: 0909-0495
• DOI: 10.1107/S090904950001712X

Transparent TiO 2 thin film photocatalysts have been prepared on silica glass plate by an ionized cluster beam (ICB) method. In order to improve the electronic properties of these photocatalysts, transition metal ions V + , Cr + , Mn + , Fe + ) were implanted into the TiO 2 thin films at high energy acceleration using an advanced metal ion-implantation technique. The combination of these ion beam techniques can allow us to prepare the TiO 2 thin film photocatalysts which can work effectively under visible light (λ > 450 nm) and/or solar light irradiation. The investigation using XAFS and ab initio molecular calculation suggests that the substitution of octahedrally coordinated Ti ions in TiO 2 lattice with implanted metal ions is important to modify TiO 2 to be able to adsorb visible light and operate under visible light irradiation.