Defect annihilation-mediated enhanced activation energy of GaAs 0.979 N 0.021 -capped InAs/GaAs quantum dots by H − ion implantation
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Published in | Thin solid films Vol. 639; pp. 73 - 77 |
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Main Authors | , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
01.10.2017
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Online Access | Get full text |
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ISSN: | 0040-6090 |
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DOI: | 10.1016/j.tsf.2017.08.026 |