($ \begin{array}{ccc}1& 0& \begin{array}{cc}\bar{1}& 1\end{array}\end{array}$) preferential orientation of polycrystalline AlN grown on SiO 2 /Si wafers by reactive sputter magnetron technique

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Bibliographic Details
Published inEuropean physical journal. Applied physics Vol. 74; no. 1; p. 10301
Main Authors Bürgi, Juan, Molleja, Javier García, Bolmaro, Raúl, Piccoli, Mattia, Bemporad, Edoardo, Craievich, Aldo, Feugeas, Jorge
Format Journal Article
LanguageEnglish
Published 01.04.2016
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ISSN:1286-0042
1286-0050
DOI:10.1051/epjap/2016150446