Effect of Dopant Activation and Plasmon Damping on Carrier Polarization in In 2 O 3 Nanocrystals
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Published in | Journal of physical chemistry. C Vol. 123; no. 49; pp. 29829 - 29837 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
12.12.2019
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Online Access | Get full text |
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Author | Tan, Yi Radovanovic, Pavle V. Ward, Matthew J. Yin, Penghui Hegde, Manu |
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Author_xml | – sequence: 1 givenname: Penghui surname: Yin fullname: Yin, Penghui organization: Department of Chemistry, University of Waterloo, 200 University Avenue West, Waterloo, Ontario N2L 3G1, Canada – sequence: 2 givenname: Yi surname: Tan fullname: Tan, Yi organization: Department of Chemistry, University of Waterloo, 200 University Avenue West, Waterloo, Ontario N2L 3G1, Canada – sequence: 3 givenname: Matthew J. surname: Ward fullname: Ward, Matthew J. organization: Advanced Photon Source, CLS@APS, Argonne National Laboratory, 9700 S. Cass Avenue, Lemont, Illinois 60439, United States – sequence: 4 givenname: Manu surname: Hegde fullname: Hegde, Manu organization: Department of Chemistry, University of Waterloo, 200 University Avenue West, Waterloo, Ontario N2L 3G1, Canada – sequence: 5 givenname: Pavle V. orcidid: 0000-0002-4151-6746 surname: Radovanovic fullname: Radovanovic, Pavle V. organization: Department of Chemistry, University of Waterloo, 200 University Avenue West, Waterloo, Ontario N2L 3G1, Canada |
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Title | Effect of Dopant Activation and Plasmon Damping on Carrier Polarization in In 2 O 3 Nanocrystals |
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