Challenges and Opportunities for Focused Ion Beam Processing at the Nano-Scale

There is a solid consensus that new methods of structure fabrication, placement, and organization within the sub-10-nm resolution gap are urgently required to meet existing challenges in condensed matter, semiconductors, and biotechnologies. Standard top-down methods such as resist-based lithographi...

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Bibliographic Details
Published inMicroscopy today Vol. 17; no. 5; pp. 14 - 17
Main Authors Gierak, J., Schiedt, B., Lucot, D., Madouri, A., Bourhis, E., Patriarche, G., Ulysse, C., Lafosse, X., Auvray, L., Bruchhaus, L., Jede, R.
Format Magazine Article
LanguageEnglish
Published New York, USA Cambridge University Press 01.09.2009
Subjects
Instrumentation
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Summary:There is a solid consensus that new methods of structure fabrication, placement, and organization within the sub-10-nm resolution gap are urgently required to meet existing challenges in condensed matter, semiconductors, and biotechnologies. Standard top-down methods such as resist-based lithographies even used at the shortest available wavelengths have clearly identified limitations. On the other hand, bottom-up approaches, like scanning probe manipulation techniques, remain challenging when trying to generate reproducible, functional, and addressable nano-structures. Therefore, at the laboratory level new routes must be explored.
ISSN:1551-9295
2150-3583
DOI:10.1017/S1551929509000479