Pseudo-complementary base-pairing involving sulfur as a robust design element in crystal engineering

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Published inActa crystallographica. Section A, Foundations and advances Vol. 74; no. a1; p. a75
Main Author Hützler, Wilhelm Maximilian
Format Journal Article
LanguageEnglish
Published 20.07.2018
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Summary:Abstract only
ISSN:2053-2733
2053-2733
DOI:10.1107/S0108767318099245