Etch Pits of 4H-Silicon Carbide Surface Formed Using Chlorine Trifluoride Gas

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Bibliographic Details
Published inMeeting abstracts (Electrochemical Society) Vol. MA2010-01; no. 22; p. 1153
Main Authors Habuka, Hitoshi, Furukawa, Kazuchika, Tanaka, Keiko, Katsumi, Yusuke, Takechi, Naoto, Fukae, Katsuya, Kato, Tomohisa
Format Journal Article
LanguageEnglish
Published 05.02.2010
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ISSN:2151-2043
2151-2035
DOI:10.1149/MA2010-01/22/1153