Investigation of the Growth of Si-Ge-Sn Pseudomorphic Layers on 200 mm Ge Virtual Substrates: Impact of Growth Pressure, HCl and Si 2 H 6 Flows
Saved in:
Published in | ECS transactions Vol. 86; no. 7; pp. 207 - 218 |
---|---|
Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
20.07.2018
|
Online Access | Get full text |
Cover
Loading…
ISSN: | 1938-6737 1938-5862 |
---|---|
DOI: | 10.1149/08607.0207ecst |