Aerosol‐Assisted CVD of SnO 2 Thin Films for Gas‐Sensor Applications

• Published in: Chemical vapor deposition Vol. 17; no. 7-9; pp. 247 - 252
• Main Authors: Stoycheva, Toni T., Vallejos, Stella, Pavelko, Roman G., Popov, Viktor S., Sevastyanov, Vladimir G., Correig, Xavier
• Format: Journal Article
• Language: English
• Published: 01.09.2011
• ISSN: 0948-1907; 1521-3862
• DOI: 10.1002/cvde.201106917

Abstract In this article is a report of SnO 2 deposition by aerosol‐assisted (AA)CVD from tin complexes, [Sn(18‐Cr‐6)Cl 4 ] and [Sn(H 2 O) 2 Cl 4 ](18‐Cr‐6). The structure and properties of the precursors, used to synthesize SnO 2 layers by AACVD for the first time, are characterized with the help of X‐ray diffraction (XRD), infrared (IR), and thermogravimetric analysis (TGA). Each complex is deposited by AACVD at 250, 400, and 500 °C in a flow of N 2 . The resulting films are studied by XRD and atomic force microscopy (AFM). Gas‐sensing properties of the deposited layers are tested to 10 ppm NO 2 in air. The maximum sensor response to the analyte is measured at 300 °C. In this article is a report of SnO 2 deposition by aerosol‐assisted (AA)CVD from tin complexes, [Sn(18‐Cr‐6)Cl 4 ] and [Sn(H 2 O) 2 Cl 4 ](18‐Cr‐6). The structure and properties of the precursors, used to synthesize SnO 2 layers by AACVD for the first time, are characterized with the help of X‐ray diffraction (XRD), infrared (IR), and thermogravimetric analysis (TGA). Each complex is deposited by AACVD at 250, 400, and 500 °C in a flow of N 2 . The resulting films are studied by XRD and atomic force microscopy (AFM). Gas‐sensing properties of the deposited layers are tested to 10 ppm NO 2 in air. The maximum sensor response to the analyte is measured at 300 °C.