Graphene segregation on Ni/SiO 2 /Si substrates by alcohol CVD method

Abstract We performed graphene synthesis on Ni films using ethanol gas in this report. A size of a segregated graphene is responsible for a size of underlying Ni catalyst according to evaluations of Raman spectroscopy, FE‐SEM and AFM. A distribution of graphene layer number is also observed because...

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Bibliographic Details
Published inPhysica status solidi. C Vol. 8; no. 2; pp. 577 - 579
Main Authors Miyasaka, Yuta, Matsuyama, Akihiro, Nakamura, Atsushi, Temmyo, Jiro
Format Journal Article
LanguageEnglish
Published 01.02.2011
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Summary:Abstract We performed graphene synthesis on Ni films using ethanol gas in this report. A size of a segregated graphene is responsible for a size of underlying Ni catalyst according to evaluations of Raman spectroscopy, FE‐SEM and AFM. A distribution of graphene layer number is also observed because of a surface roughness of Ni. A domain size of segregated graphene networks depends on the size of underlying Ni grains. Comparing plots of W 2D as a function of I G /I 2D between a segregated graphene on a Ni film and exfoliated graphene on SiO 2 /Si substrates by pealing method, shows similar tendency. Thus, layer number of segregated graphene on Ni film can be speculated without transferring into other substrates. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
ISSN:1862-6351
1610-1642
DOI:10.1002/pssc.201000533