Large single-domain growth of monolayer WS 2 by rapid-cooling chemical vapor deposition

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Bibliographic Details
Published inApplied physics express Vol. 10; no. 7; p. 75201
Main Authors Li, Chao, Yamaguchi, Yoshiki, Kaneko, Toshiro, Kato, Toshiaki
Format Journal Article
LanguageEnglish
Published 01.07.2017
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ISSN:1882-0778
1882-0786
DOI:10.7567/APEX.10.075201