Simplified Surface Reaction Model of SF 6 /CHF 3 Plasma Etching of SiN Film

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Published inJapanese Journal of Applied Physics Vol. 48; no. 8; p. 8
Main Authors Iwakoshi, Takehisa, Aoyama, Takayuki, Nara, Yasuo, Ohji, Yuzuru
Format Journal Article
LanguageEnglish
Published 01.08.2009
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Author Nara, Yasuo
Iwakoshi, Takehisa
Aoyama, Takayuki
Ohji, Yuzuru
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Chang (JJAP-48-08HA01-5) 2001; 19
Wu (JJAP-48-08HA01-12) 1995; 4
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Title Simplified Surface Reaction Model of SF 6 /CHF 3 Plasma Etching of SiN Film
Volume 48
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