Simplified Surface Reaction Model of SF 6 /CHF 3 Plasma Etching of SiN Film

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 48; no. 8; p. 8
Main Authors Iwakoshi, Takehisa, Aoyama, Takayuki, Nara, Yasuo, Ohji, Yuzuru
Format Journal Article
LanguageEnglish
Published 01.08.2009
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.48.08HA01