Mechanism of CF Polymer Film Deposition through High-Aspect-Ratio SiO 2 Holes

The deposition of polymer films through SiO 2 microholes was studied by using a multichannel capillary array (MCA). CHF 3 plasma polymer films were deposited on Si substrates through an MCA (hole diameter 10 µm, aspect ratio 40) made of lead glass, and X-ray photoelectron spectroscopy was used to an...

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 33; no. 12A; p. L1717
Main Authors Ono, Tetsuo, Hamasaki, Ryoji, Tatsumi Mizutani, Tatsumi Mizutani
Format Journal Article
LanguageEnglish
Published 01.12.1994
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Summary:The deposition of polymer films through SiO 2 microholes was studied by using a multichannel capillary array (MCA). CHF 3 plasma polymer films were deposited on Si substrates through an MCA (hole diameter 10 µm, aspect ratio 40) made of lead glass, and X-ray photoelectron spectroscopy was used to analyze the films. The deposition rate under MCA was higher than those of flat surfaces. Pb from the MCA material was detected in the film deposited through the MCA, and CF polymers deposited through the MCA were more carbon rich than those deposited outside the MCA. These results suggest that polymers reach the bottom of the hole by being etched from and redeposited on the sidewall.
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.33.L1717