Homogeneous TiO 2 –SiO 2 Ultralow-Expansion Glass for Extreme Ultraviolet Lithography Evaluated by the Line-Focus-Beam Ultrasonic Material Characterization System

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Bibliographic Details
Published inApplied physics express Vol. 1; p. 87002
Main Authors Kushibiki, Jun-ichi, Arakawa, Mototaka, Ueda, Tetsuji, Fujinoki, Akira
Format Journal Article
LanguageEnglish
Published 01.08.2008
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ISSN:1882-0778
1882-0786
DOI:10.1143/APEX.1.087002