Magnetic Penetration Depths and Normal-State Resistivities of Epitaxial and Polycrystalline NbC x N 1-x Films
We have studied the magnetic penetration depth λ and the normal-state resistivity ρ of epitaxial and polycrystalline NbC x N 1- x films as a function of film thickness t and sputtering gas pressure P during the deposition of the films. It was found that λ(∼200 nm) and ρ(∼50 µΩ·cm) of epitaxial films...
Saved in:
Published in | Japanese Journal of Applied Physics Vol. 31; no. 3A; p. L239 |
---|---|
Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
01.03.1992
|
Online Access | Get full text |
Cover
Loading…
Summary: | We have studied the magnetic penetration depth λ and the normal-state resistivity ρ of epitaxial and polycrystalline NbC
x
N
1-
x
films as a function of film thickness
t
and sputtering gas pressure
P
during the deposition of the films. It was found that λ(∼200 nm) and ρ(∼50 µΩ·cm) of epitaxial films are almost independent of
P
and
t
, while λ(>300 nm) and ρ(>110 µΩ·cm) of polycrystalline films increase considerably with increasing
P
(>2 Pa) or decreasing
t
(<80 nm). The pressure and thickness dependence of λ and ρ of polycrystalline films can be explained by a model of Josephson coupling between grains. |
---|---|
ISSN: | 0021-4922 1347-4065 |
DOI: | 10.1143/JJAP.31.L239 |