Metalorganic Chemical Vapor Deposition of Thin Film ZrO 2 and Pb(Zr,Ti)O 3 : Precursor Chemistry and Process Characteristics

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Bibliographic Details
Published inJapanese Journal of Applied Physics Vol. 41; no. Part 1, No. 11B; pp. 6695 - 6700
Main Authors Chen, Ing-Shin, Hendrix, Bryan C., Bilodeau, Steven M., Wang, Ziyun, Xu, Chongying, Johnston, Stephen, Van Buskirk, Peter C., Baum, Thomas H., Roeder, Jeffrey F.
Format Journal Article
LanguageEnglish
Published 30.11.2002
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ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.41.6695